WebJun 1, 2004 · In order to prevent the agglomerated slurry particles from slurry inflow, we installed a 0.5-m point-of-use (POU) filter, which is a depth-type filter and has 80% filtering efficiency for the 1.0 ... Web列表数据仅在虚线下方。 全文数据即将推出。
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WebJun 1, 2004 · Fig. 1a schematically shows the CMP process system used in this experiment. The system is composed of main slurry supply system, a main filter, and a POU filter. Fig. 1b approximately shows the IPEC AVANTI-472 CMP polisher (SpeedFam, USA), which installs a depth-type POU filter into the slurry supply system of CMP equipment. Fig. 1c … WebKlebosol® slurries are the most widely used water-glass colloidal silica products for CMP of semiconductor devices, interlayer dielectrics, shallow trench isolation, polysilicon, and post-metal buff. The silica particles are grown in a liquid medium and maintain excellent stability. Other Slurry Materials. DuPont also offers Nanopure ... WebJul 1, 2024 · In a previous study, we improved cleaning efficiency by 34.7% when a TFF system was applied to the ceria slurry before CMP process [23]. The slurry circulated for 2 h at 1 lpm through a TFF system with a 0.1 μ m membrane pore size, separating 30.7% of ceria particles that were smaller than the pore size. Moreover, the TFF system did not … cheap houses for sale in greece